Synopsys at Photomask Technology '08

October 6-10, 2008
Monterey Marriott and Conference Center
Monterey, California USA

Tuesday, October 7 and Wednesday, October 8
Visit Synopsys in Booth #209

Come see how Synopsys' Manufacturing solution enables you to achieve more from your photomask and advanced lithography technologies. We will showcase enhancements made to Synopsys’ production-proven mask synthesis, lithography simulation, and leading mask data preparation so you can experience superior cost of ownership, turnaround time, and accuracy of results. Some of the technology leading products we'll highlight:

• Proteus OPC, Sentaurus Lithography simulation, CATS mask data preparation

Keynote Presentation by Dr. Aart J. de Geus
Tuesday, October 7, 8:10a.m. to 8:50a.m., Steinbeck Forum Room
Since co-founding Synopsys in 1986, Dr. Aart de Geus has expanded Synopsys from a start-up synthesis enterprise to a world leader in software and IP for semiconductor design and manufacturing. Come hear what he has to share with the 2008 Photomask Technology Symposium attendees.

Come see Synopsys in the Technical Program
Hear the latest research Synopsys is involved in regarding current and future issues facing the photomask industry through technology leading papers and presentations.

Poster Sessions in Serra Grand Ballroom
(Tues. 6:00 to 7:30pm and Wed. 10:00am to 3:00pm)

RET and OPC/ORC I
7122-33 32-nm design rule and process exploration flow

Simulation and Modeling
7122-65 Extracting mask error enhancement function from signal slices: potential for fast MEEF characterization, verification, and correction

7122-153 Effective hotspot detection and classification with correction guidance for designers

7122-144 Focus blur model to enhance lithography model for optical proximity correction .

7122-157 Modified wave-front sizing algorithm with preprocessed clipping

7122-147 Empirical study of OPC metrology requirements for 32-nm node logic

Tuesday, October 7
Session 6: DPL Implementation II
7122-24 Printability verification for double-patterning technology
(Tues. 1:20, Ferrante room)

Session 7: RET and OPC/ORC I: (Tues. 2:40, Ferrante room)
7122-28 Model-based assist feature placement: an inverse imaging approach

Wednesday, October 8
Session 13: RET and OPC/ORC II (Wed. 9:10, Ferrante room)
7122-59 Automated OPC model collection, cleaning, and calibration flow

Thursday, October 9
Session 25: Advanced CD Metrology (Thur. 11:00, Ferrante)
7122-121 Implementation of multiple ROI with single FOV for advanced mask metrology

If you would like more information or to schedule an appointment, please contact the Synopsys sales representative in your local area or email us at Manufacturing@synopsys.com

Enjoy An Evening Reception (invitation only)

After a long day learning about the latest industry trends and product updates, Join Synopsys for a relaxing, fun evening.

Date: Wednesday, October 8, 2008
Time: 6:00p.m. – 9:00p.m.
Place: Portola Plaza Hotel -- Portola Room (level one)

After a long day learning about industry trends and updates, join Synopsys for a relaxing evening featuring hors d’oeuvres and a wine tasting of coastal varietals, all while enjoying live music. Stop by and see our caricature artist who will draw you a souvenir picture to remember this year’s conference by. Plus, one lucky guest will win a great drawing prize (must be present to win).