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- Distributed Processing
- Lithography Output Options:
- E-Beam:
- Cambridge™
- Hitachi™
- JEOL™
- MEBES™ - Now with Mode-5 Support
- Micronic™
- Philips™
- Toshiba VSB 8/11
- Varian ALF™
- Optical Pattern Generator:
- Electromask English, Metric
- Mann 3000,3600, Eng., Metric
- Design Output Options:
- Applicon™
- GDSII Stream™
- CIF™
- Inspection Options:
- Graphical Options:
- MEBES Job Deck Viewing
- MEBES Job Deck Editing
- Hitachi Job Text File Viewing
- JEOL Job Deck Viewing
- JEOL Job Deck Editing
- Versatec™ Plotting
- Sixel™ (DEC) Plotting
- Postscript™ Plotting
- HP-RTL Plotting
- Metrology Options:
- SiScan RIF™
- Leica LMS-2000 MF2
- Leica IPRO
- Nikon 2I & 3I Control File
- Zygo KMS
- KLA-8100 CD-Sem
- Fracture / Synthesis Options:
- CATS Jobdeck Smash
- CATS Keep (polygon selection)
- MRC: manufacturing rule checks
- CATS Serif Generation
- Proximity Correction Options:
- EBPC:
- Proxecco™ by aiss, GmbH
- Sceleton™ by aiss, GmbH
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