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The Sentaurus TFM (TCAD for Manufacturing) suite, which includes PCM Studio and PCM Library, provides a powerful environment for capturing multivariate process–device–circuit relationships in process compact models (PCMs), allowing a fast turnaround for identifying and analyzing factors that cause parametric yield loss in manufacturing. Derived from systematic TCAD simulations, PCMs encapsulate relationships between process variations and device–circuit performance through a set of analytic functions.
PCM Studio enables the construction of PCMs, the visual exploration of data (simulated or measured), and the statistical analysis of the impact of process variability on device and circuit performance. With PCM Library, the process compact models can be embedded into data-mining and yield management tools for further statistical yield analysis.
- Benefits
- Bring the power of TCAD-based variability analysis to manufacturing, with an intuitive graphical user interface
- Quantify, explore, visualize, and understand process–device–circuit relationships and their impact on yield in seconds
- Perform statistical process analysis and process optimization to improve parametric yield
- Create process compact models from simulation data and manufacturing data, allowing comprehensive yield management and analysis
- Embed PCMs into statistical tools, data-mining systems, and yield management systems, as well as Tcl-based applications for comprehensive yield analysis
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