Mask Solutions

For development use models, Proteus and S-Litho have been tightly integrated to provide the upmost accuracy and predictability to deliver faster time-to-market results. Synopsys’ Mask Synthesis tools have been industry tested for almost two decades and are the tool of choice for leading-edge IDM’s and foundries. 

Photolithography is the most critical and most expensive step within the manufacturing flow for semiconductor devices.  As an industry standard, S-Litho provides the core simulation technology to explore patterning options in DUV and EUV lithography, accelerate development, and reduce the number of costly experiments.  The comprehensive analysis of metrology data through S-Metro is critical for building accurate and predictive models.  The tools can be deployed embedded in Silicon WorkBench, a powerful layout visualization utility, for easy navigation within a test clip or a production circuit.