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Description
Photonic device production is increasing with AR/VR devices. AR/VR optical components include metalenses patterned over large areas, and the fidelity of this pattern may have a significant impact on performance. In this presentation, we will demonstrate the impact of various lithographic and correction techniques on metalens performance.
Presenters
Dr. Maryvonne Chalony
Senior Applications Engineer
Synopsys
Dr. Maryvonne Chalony received a Ph.D. degree in Physical Sciences from the University of Nice-Sophia Antipolis in 2010. She is now an applications engineer in Hyeres, France for Synopsys Optical Solutions. She has 10 years of optical and photonic software experience with a focus on photonics and nano-structure design and simulation.
Bernd Küchler
Applications Engineer
Synopsys
Bernd Küchler is a Lithography Simulation Applications Engineer at Synopsys. He holds an M.Sc. degree in Information Technology from Chalmers University, Gothenburg, Sweden.
Prior to Synopsys, Bernd worked at Infineon on future lithography development.
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