Cloud native EDA tools & pre-optimized hardware platforms
Join us for an in-person Synopsys Technical Forum, taking place during 2025 SPIE Advanced Lithography + Patterning. Attendees will learn about the latest industry trends along with Synopsys Manufacturing's mask synthesis, mask data prep, and lithography simulation solutions.
Synopsys provides industry-proven EDA solutions to meet the demands of today’s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next-generation technology nodes. Synopsys’ comprehensive Mask Synthesis, Mask Data Preparation, TCAD, and Yield Management tools provide leading edge performance, accuracy, quality, and cost of ownership for all your production and development needs.
The Synopsys Technical Forum provides OPC, RET, and MDP engineers and managers practical insight into upcoming industry trends and solutions for delivering the highest quality results from their lithography hardware.
Presenter: Kostas Adam - Vice President of R&D Engineering, Synopsys
Date & Time: February 25 | 11:10 – 11:50 AM
See the full list of Synopsys presented papers & technical sessions happening at SPIE.
Visit our booth on the exhibit floor to view the latest innovative technologies and chat with Synopsys experts live on February 25-26!